- NIKON NSR 4425i 步进式光刻机
- 发布时间：2017/6/30 17:22:13 修改时间：2017/6/30 17:22:13 浏览次数：840
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NIKON NSR 4425i 步进式光刻机
WAFER SPECIFICATION :
Wafer Size : 200MM
Wafer Shape : SNNF (Semi Notch No Flat)
Wafer Cassette : 8” PP Miraial
SMIF Interface : No
SYSTEM ConFIGURATION :
Projection Lens / Illumination System :
Magnification : 1/2.5
Field Size : 44x44mm ～ 54x30.9mm (within φ62.22mm)
Light Source : i-line (365nm), Mercury Lamp 2.5kW
Reticle Blind Setting Area : Max : Field size, Min : 2.5mm x 2.5mm
Reticle Stage :
Reticle Holder size : 6inch
Wafer Alignment :
Alignment sensor : LSA / FIA
Wafer Stage :
Wafer Holder size : 200mm
Max speed : Over 180mm/sec
Wafer Loader :
Loader Type : 8" loader
Pre-alignment Type : Pre-alignment2
Carrier Table# : 2
Inline Type : Right Inline
Reticle Loader :
Library# : 22
Reticle Case Type : Clear case (Nikon type-2)
Particle checker : Pellicle Particle Detector(PPD)
Note the above information is for guidance only and was the tools original configuration. Changes to configuration might have been made
