NIKON NSR 4425i 步进式光刻机

NIKON NSR 4425i 步进式光刻机



 

WAFER SPECIFICATION : 

Wafer Size : 200MM

Wafer Shape : SNNF (Semi Notch No Flat)

Wafer Cassette : 8” PP Miraial

SMIF Interface : No

SYSTEM ConFIGURATION : 

Projection Lens / Illumination System : 

Magnification : 1/2.5

Field Size : 44x44mm ～ 54x30.9mm (within φ62.22mm)

Light Source : i-line (365nm), Mercury Lamp 2.5kW

Reticle Blind Setting Area : Max : Field size, Min : 2.5mm x 2.5mm

Reticle Stage : 

Reticle Holder size : 6inch

Wafer Alignment : 

Alignment sensor : LSA / FIA

Wafer Stage : 

Wafer Holder size : 200mm

Max speed : Over 180mm/sec

Wafer Loader : 

Loader Type : 8" loader

Pre-alignment Type : Pre-alignment2

Carrier Table# : 2

Inline Type : Right Inline

Reticle Loader : 

Library# : 22

Reticle Case Type : Clear case (Nikon type-2)

Particle checker : Pellicle Particle Detector(PPD)

Note the above information is for guidance only and was the tools original configuration. Changes to configuration might have been made